Generalized scanning beam interference lithography system for patterning gratings with variable period progressions
نویسندگان
چکیده
We demonstrate a versatile interference lithography system that can continuously vary the pattern period and orientation during fabrication of general periodic structures in one or two dimensions. Initial experimental results, using closed-loop beam steering control and double exposures on a stationary substrate, are obtained in order to illustrate its principle of operation. A fringe-locking scheme for phase control is also demonstrated including discussion of issues related to future system developments. © 2002 American Vacuum Society. @DOI: 10.1116/1.1520563#
منابع مشابه
Progress towards a general grating patterning technology using phase-locked scanning beams
The fabrication of large high-quality diffraction gratings remains one of the most challenging tasks in optical fabrication. Traditional direct-write methods, such as diamond ruling or electron-beam lithography, can be extremely slow and result in gratings with undesired phase errors. Holographic methods, while generally resulting in gratings with smoother phase, frequently require large aspher...
متن کاملNanometer-accurate Grating Fabrication with Scanning Beam Interference Lithography
We are developing a Scanning Beam Interference Lithography (SBIL) system. SBIL represents a new paradigm in semiconductor metrology, capable of patterning large-area linear gratings and grids with nanometer overall phase accuracy. Realizing our accuracy goal is a major challenge because the interference fringes have to be locked to a moving substrate with nanometer spatial phase errors while th...
متن کاملDoppler writing and linewidth control for scanning beam interference lithography
Scanning beam interference lithography SBIL is a technique which is used to create large-area periodic patterns with high phase accuracy. This is accomplished by combining interference lithography and an X-Y scanning stage. We previously reported parallel scan mode in which the stage scans in a direction parallel to the interference fringes. Here we present a method called Doppler scanning. In ...
متن کاملBeam alignment for scanning beam interference lithography
By interfering two small diameter Gaussian laser beams, scanning beam interference lithography ~SBIL! is capable of patterning linear gratings and grids in resist while controlling their spatial phase distortions to the nanometer level. Our tool has a patterning area that is up to 300 mm in diameter. The motive for developing SBIL is to provide the semiconductor industry with a set of absolute ...
متن کاملDesign and analysis of a scanning beam interference lithography system for patterning gratings with nanometer-level distortions
This thesis describes the design and analysis of a system for patterning large-area gratings with nanometer level phase distortions. The novel patterning method, termed scanning beam interference lithography (SBIL), uses the interference fringes between two coherent laser beams to define highly coherent gratings in photo resist. The substrate is step and scanned under the interference pattern t...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
عنوان ژورنال:
دوره شماره
صفحات -
تاریخ انتشار 2002